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13:00
Reminisce - Refurbishment of Mirrors to Increase Sustainability at Light Sources - Introduction of a European collaboration project
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Silja Schmidtchen
(European X-Ray Free Electron Laser Facility)
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13:06
New online polarization diagnostics for 3rd harmonic afterburner radiation
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Markus Braune
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13:12
In-situ Cryogenic Cleaning of Tin-Contaminated EUV Optics
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Norbert Böwering
(Fakultät für Physik, Universität Bielefeld)
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13:18
Ultra-compact inline transmission grating spectrograph for extreme ultraviolet wavelengths
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Sascha Brose
(RWTH Aachen University - Chair for Technology of Optical Systems TOS)
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13:24
Stand-alone extreme ultraviolet (EUV) metrological system for optical characterization of lithography materials
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Wooram Kim
(Korea Research Institute of Standards and Science (KRISS))
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13:30
Influence of experimental conditions on EUV / X-ray fluorescence yields investigated with the WDSX-300
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Valentin Stoytschew
(IAP-Adlershof e.V.)
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13:36
Enhanced thin film characterization through combined S- and P-polarized EUV reflectometry
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Samira Naghdi
(Physikalisch-Technische Bundesanstalt (PTB) Berlin)
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13:42
Investigation of the Optical Constants of Amorphous SiO₂ and Y-Cut Quartz from the Extreme to the Vacuum Ultraviolet Spectral Region
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Najmeh Abbasirad
(PTB)
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13:48
Simulated XUV spectroscopy in the laboratory with a polycapillary half lens and reflection zone plates
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Jürgen Probst
(NOB Nano Optics Berlin GmbH)
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13:54
X-ray standing wave coherence length in grazing exit geometry
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Timur Terentev
(University of Twente)
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14:00
Exploring the soft X-ray energy range for next generation nanostructure metrology
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Analía Fernández Herrero
(PTB)
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14:06
Scatterometry Applications: Addressing Model Inaccuracies
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Maren Casfor
(Physikalisch-Technische Bundesanstalt)
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14:12
Calibration of a broadband reflective spectrometer for high-resolution spectral characterization of radiation sources
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Sophia Schröder
(RWTH Aachen University - Chair for Technology of Optical Systems TOS)
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14:18
Using Monte Carlo-based Uncertainty Quantification for Free-Form XRR
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Hendrik Willem Lokhorst
(University of Twente)
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14:24
On the way to automatized optics adjustment at FEL sources
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Klaus Mann
(Ifnano)