PTB-Seminar on VUV and EUV Metrology 2025

Session

Session 1

14 Oct 2025, 10:40

Lecture Hall in Hermann-von-Helmholtz Building (PTB Berlin)

3. EUV-induced oxidation of thin CrOx films on SiNk free-standing windows

Duncan Ramsamoedj (University of Twente)

14/10/2025, 10:40

oral

For advancements in EUV lithography, the behaviour of thin film materials during EUV exposure in various background gas conditions is key to find the optimal material properties. Therefore, we investigated the EUV- and radical-driven degradation mechanisms of chromium oxide ($CrO_x$) cap layers (3-5 nm) on $SiN_k$ free-standing windows in a vacuum, hydrogen and water background. In this...

11. Latent images in EUV photoresists measured with a lab-scale EUV scatterometry setup

Sophia Schröder (RWTH Aachen University - Chair for Technology of Optical Systems TOS)

14/10/2025, 11:00

oral

The authors present their recent work on the identification and characterization of latent images in EUV photoresists using a small-scale EUV reflectometry and scatterometry setup at RWTH Aachen University. Optical metrology methods like scatterometry can identify latent images, if the photochemical changes in the resist lead to an optically detectable change of the material or a variation in...

18. Quantitative characterization of angstrom-scale roughness via diffuse scatter at near-grazing geometry using a table-top 92eV HHG source

Dr Vitaly Krasnov (imec)

14/10/2025, 11:20

oral

Extreme ultraviolet (EUV) and soft X-ray radiation can be efficiently utilized for non-destructive characterization of nanostructures with nanometer accuracy. Conventional scatterometry enables structural characterization of periodic structures [1] while diffuse scatter measurements allow to characterize surface and interface roughness [2]. In this work we demonstrate results of the first time...