PTB-Seminar on VUV and EUV Metrology 2025

Session

Opening & Keynote 1

14 Oct 2025, 09:30

Lecture Hall in Hermann-von-Helmholtz Building (PTB Berlin)

36. Welcome, Opening and Overview

Alexander Gottwald (PTB), Michael Kolbe (Physikalisch-Technische Bundesanstalt (PTB), Berlin)

14/10/2025, 09:30

oral

16. Present and Future of EUV lithography

Mark van de Kerkhof (ASML)

14/10/2025, 10:00

oral

EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of 10-20 nm lithographic structures. Last year, the next generation of EUV scanners has started shipping, extending the resolution to feature sizes of below 10 nm.
Work has started on extending the resolution limits further by increasing the NA – and possibly even further by reducing the wavelength below 13.5...