13–15 Oct 2025
PTB Berlin
Europe/Berlin timezone

Optics for EUV-Lithography, now and then

15 Oct 2025, 09:00
40m
oral Keynote 2

Speaker

Hartmut Enkisch (Carl Zeiss SMT GmbH)

Description

EUV-Optics with NA=0.33 are fully industrialized and are a key ingredient to the state-of-the-art semiconductor devices. We will shortly comment on the relevant performance indices.
We will also describe the outstanding performance of the high-NA optics with NA=0.55 currently being introduced into the market. Finally, we will comment on the challenges that would come with either higher NA (hyper-NA) or shorter wavelengths (beyond EUV) with a special focus on metrological challenges like the need for precise optical constants, roughness metrology, and reflectometry.

Author

Hartmut Enkisch (Carl Zeiss SMT GmbH)

Presentation materials