Keynote
Author: Louise Wright, National Physical Laboratory (NPL)
Title: VirtMet in the wild: virtual metrology and virtual testing
Abstract:
The interest in using simulation as part of product certification or approval processes is growing. Manufacturing industry can reduce costs and cut time to market for new products by replacing physical test with simulation. Medical device companies can demonstrate product performance for a wider range of anatomies than could easily be recruited for real-world trials. Autonomous vehicle developers can use virtual testing environments to explore situations that would put lives at risk if encountered in the real world. But just as metrology knowledge underpins the standards used in physical testing, virtual metrology needs to underpin the approaches used in virtual testing. This talk will discuss the commonality between the virtual testing needs in different areas, and will highlight how metrology can ensure that the switch to virtual approaches does not lead to reduced levels of product safety.
Keynote
Author: Hugo Cramer, ASML
Title: The use of simulation models in semiconductor optical metrology
Abstract:
The continuous shrink of dimensions and tolerances in the semiconductor industry enabled by developments of manufacturing processes goes hand in hand with the evolution of metrology tools. Driven by the need for high-speed, high accuracy and low cost metrology in high volume manufacturing, optical metrology has become one of the workhorses in various patterning applications. The main applications in lithography, overlay (misregistration) and CD (line width) demand sub-nm accuracy and robustness against varying process conditions.
In optical overlay metrology we can use detailed simulations to improve the measurement method via a combination of optimal measurement conditions and OV extraction [1].
In CD applications, where separation of multiple parameters is a challenge of its own, the simulations form the basis of model-based parameter inference. At the same time, model simulations can be used to develop, improve and assess the capabilities a model-based metrology system.
In this presentation we will discuss different parameter inference methods, and show how simulations of the tool and the target has help to keep up with the requirements of the industry.
References
[1] Simon Mathijssen, et.al. "Fundamental understanding of the interplay between target and sensor brings diffraction based overlay to the next level of accuracy", *Proc. SPIE* 11611 (2021); [doi:10.1117/12.2584973](https://doi.org/10.1117/12.2584973)
[2] Hugo Cramer, et.al. "High-speed, full 3D feature metrology for litho monitoring, matching, and model calibration with scatterometry", *Proc. SPIE* 8324 (2012); [doi:10.1117/12.919050](https://doi.org/10.1117/12.919050)
Keynote
Author: Tino Hausotte, FAU Erlangen-Nürnberg
Title: Numerical measurement uncertainty estimation for industrial computed tomography - from basic qualified software for X-ray radiographic simulation tools to numerical measurement uncertainty estimation using a virtual CT system
Abstract:
According to the current state of research and technology, estimating the measurement uncertainty for coordinate measurements with industrial X-ray CT systems is either far too time-consuming [1] or does not sufficiently consider relevant influencing quantities [2]. Although the effort for constructing a virtual CT system (also defined as digital model for radiographic imaging) and conducting a numerical measurement uncertainty estimation is high, a measurement uncertainty estimation according to GUM Supplement 1 by the use of the Monte Carlo method is regarded by many experts as expedient. This overall objective forms the basis of the realisation of the CTSimU project series [3].
This contribution is intended to provide a brief overview of the uncertainty estimation for measurements with industrial X-ray CT systems. Following this overview, the CTSimU project series and its goals will be presented in the subsequent part. The basic qualification of radiographic simulation tools and the developed standard VDI/VDE 2630 Part 2.2 are the results of the first project. The primary objective of the second phase was a standardised test of the digital model of industrial X-ray CT systems. These two projects form the foundation for the preliminary last project phase - the numerical measurement uncertainty estimation according to GUM Supplement 1 using a virtual X-ray CT system.
References
[1] VDI/VDE 2630 Part 2.1:2015-06 . Computertomografie in der dimensionellen Messtechnik - Bestimmung der Messunsicherheit und der Prüfprozesseignung von Koordinatenmessgeräten mit CT-Sensoren
[2] HERNLA, M.: Messunsicherheit bei Koordinatenmessungen. Ermittlung der aufgaben-spezifischen Messunsicherheit durch Unsicherheitsbilanzen. 4. expert verlag Tübingen, 2020. – ISBN 978–3816935094
[3] JOINT COMMITTEE FOR GUIDES IN METROLOGY (JCGM/WG 1): JCGM 101:2008 - Evaluation of measurement data - Supplement 1 to the Guide to the expression of uncertainty in measurement - Propagation of distributions using a Monte Carlo method. 2008
