Alexander Gottwald
(PTB),
Michael Kolbe
(Physikalisch-Technische Bundesanstalt (PTB), Berlin)
14/10/2025, 09:30
oral
Mark van de Kerkhof
(ASML)
14/10/2025, 10:00
oral
EUV scanners have been adopted worldwide for High-Volume Manufacturing (HVM) of 10-20 nm lithographic structures. Last year, the next generation of EUV scanners has started shipping, extending the resolution to feature sizes of below 10 nm.
Work has started on extending the resolution limits further by increasing the NA – and possibly even further by reducing the wavelength below 13.5...
