RWTH Aachen University Chair for Technology of Optical Systems TOS
Author in the following contributions
- Latent images in EUV photoresists measured with a lab-scale EUV scatterometry setup
- Calibration of a broadband reflective spectrometer for high-resolution spectral characterization of radiation sources
- Influence of the model selection in analysis of EUV reflectometry data
- A lab-scale EUV high intensity exposure setup for small-spot exposures and angular resolved photoelectron spectroscopy